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Niobium Sputtering Target Release time: 2020-06-10  Views: 628
Niobium Sputtering Target

Product Description:


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Yuxiang supplies high purity and density niobium and niobium alloys target for all PVD applications. Niobium sputtering targets can be produced in planar and rotatable configurations to fit customer specified backing plates or cups with either indium/tin or silver epoxy bonding.

Niobium thin films are used in superconducting applications, optical filters, radiation sensors, corrosion protection, superconducting bolometers, photonics, medical devices and capacitors etc.

 



Application:


Niobium sputtering target material is an important material for thin film technology. The final purity of Niobium target material can be higher than 99.95%, and its grain size is small, recrystallization structure and three axial consistency are good. As a cathode sputtering target material, the oxide film formed by it is uniform in quality, and will not react with other substances in the air, with lasting protective effect. Niobium sputtering target has been widely used in optical fiber, semiconductor chip and integrated circuit.




Specification:


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